Layerava from Okyay Tech is an adaptable research device designed for university and industrial research laboratories that use Hollow Cathode Plasma Enhanced Atomic Layer Deposition (HCP-ALD).

Inductively coupled plasma (ICP) sources were first developed decades ago, with regular use in the semiconductor industry at a time when plasma sources primarily deposited silicon oxide and silicon ...

Second-generation platform delivers advanced control, in-cycle annealing, and high-throughput performance for Wide Bandgap power and RF device manufacturing ESPOO, Finland, Nov. 24, 2025 /PRNewswire/ ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...